紫外光

经过国家重大科技基础设施研发团队历时五年的顽强拼搏，长期制约我国极紫外光刻机核心光源技术瓶颈终于被成功破解。

jīng guò guó jiā zhòng dà kē jì jī chǔ shè shī yán fā tuán duì lì shí wǔ nián de wán qiáng pīn bó, cháng qī zhì yuē wǒ guó jí zǐ wài guāng kè jī hé xīn guāng yuán jì shù píng jǐng zhōng yú bèi chéng gōng pò jiě.

After five years of tenacious efforts by the national major scientific and technological infrastructure research and development team, the bottleneck of core light source technology that has long restricted my country's extreme ultraviolet lithography machines has finally been successfully cracked.