真空

在进行高精度半导体晶圆光刻制造时，整个核心曝光反应腔体内必须保持绝对洁净的高真空状态。

zài jìn xíng gāo jīng dù bàn dǎo tǐ jīng yuán guāng kè zhì zào shí, zhěng gè hé xīn bào guāng fǎn yìng qiāng tǐ nèi bì xū bǎo chí jué duì jié jìng de gāo zhēn kōng zhuàng tài.

When manufacturing high-precision semiconductor wafer lithography, the entire core exposure reaction chamber must maintain an absolutely clean high vacuum state.